Description

This tender is for modifications to an existing Corial 200IL - 40 ICP Etcher. Currently this etch system is configured with the following gases: SF6, CHF3, C2H4 and O2. These gases are housed in an external gas enclosure situated some 20m away from the
main building. In order to accommodate a planned extension of the processing capability there is a requirement to augment the ICP etch capability by the addition of chlorine etch chemistry based on the following gases: Chlorine (Cl2), Boron trichloride (BCl3)
and Silicon tetrachloride (SiCl4). These gases will be located in a dedicated extracted cabinet in the service chase adjacent to the ICP etch system. Please refer to http://in-tendhost.co.uk/universityofwarwick for further information. You will be able to
download the full tender documents from this site. Any queries in relation to this requirement should be directed to the University of Warwick via the correspondence functionality of our e-tendering system. Failure to do so may result in queries being excluded
from the procedure.